Nano Archive

Nanogrids and Beehive-Like Nanostructures Formed by Plasma Etching the Self-Organized SiGe Islands

Chang, Yuan-Ming and Jian, Sheng-Rui and Juang, Jenh-Yih (2010) Nanogrids and Beehive-Like Nanostructures Formed by Plasma Etching the Self-Organized SiGe Islands. Nanoscale Research Letters, 5 (9). pp. 1456-1463.

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Abstract

A lithography-free method for fabricating the nanogrids and quasi-beehive nanostructures on Si substrates is developed. It combines sequential treatments of thermal annealing with reactive ion etching (RIE) on SiGe thin films grown on (100)-Si substrates. The SiGe thin films deposited by ultrahigh vacuum chemical vapor deposition form self-assembled nanoislands via the strain-induced surface roughening (Asaro-Tiller-Grinfeld instability) during thermal annealing, which, in turn, serve as patterned sacrifice regions for subsequent RIE process carried out for fabricating nanogrids and beehive-like nanostructures on Si substrates. The scanning electron microscopy and atomic force microscopy observations confirmed that the resultant pattern of the obtained structures can be manipulated by tuning the treatment conditions, suggesting an interesting alternative route of producing self-organized nanostructures.

Item Type:Article
Uncontrolled Keywords:SiGe - High-resolution reciprocal space mapping - SEM - AFM - TEM
Subjects:Material Science > Nanofabrication processes and tools
Material Science > Nanostructured materials
ID Code:9538
Deposited By:SPI
Deposited On:21 Oct 2010 09:30
Last Modified:21 Oct 2010 09:30

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