Nano Archive

Pores in n-Type InP: A Model System for Electrochemical Pore Etching

Leisner, Malte and Carstensen, Jurgen and Foll, Helmut (2010) Pores in n-Type InP: A Model System for Electrochemical Pore Etching. Nanoscale Research Letters, 5 (7). pp. 1190-1194.

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Official URL: http://www.ncbi.nlm.nih.gov/pmc/articles/PMC289420...

Abstract

The growth mechanism of currentline-oriented pores in n-type InP has been studied by Fast-Fourier-Transform Impedance Spectroscopy (FFT IS) applied in situ during pore etching and by theoretical calculations. Several pore growth parameters could thus be extracted in situ that are otherwise not obtainable. These include the space-charge-region (SCR) width, the SCR potential, the capacitance at the pore tips, and the avalanche breakdown field strength. It could be demonstrated that the system adjusts itself in such a way that the potential across the space-charge-region at the pore tips is kept constant within a certain bandwidth of the applied potential. This provides for a constant field strength at the pore tips, ensuring that avalanche breakdown occurs, generating the necessary holes for the electrochemical dissolution of InP.

Item Type:Article
Subjects:Physical Science > Nanophysics
Physical Science > Nano objects
Material Science > Nanochemistry
Material Science > Nanostructured materials
Divisions:Faculty of Engineering, Science and Mathematics > School of Physics
Faculty of Engineering, Science and Mathematics > School of Chemistry
ID Code:9366
Deposited By:JNCASR
Deposited On:01 Oct 2010 09:50
Last Modified:01 Oct 2010 09:50

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