Fellahi, O. and Hadjersi, T. and Maamache, M. and Bouanik, S. and Manseri, A. and Guerbous, L. (2010) Influence of crystalline damage on morphological and optical properties of silicon nanowires. Optical Materials, 32 (7). 768 - 771.
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Official URL: http://www.sciencedirect.com/science/article/B6TXP...
We have studied the effect of crystalline damage on the morphological and optical properties of silicon nanowires (SiNWs) formed by electroless etching. Ag nanoparticles were deposited on p-type Si wafers by electroless metal deposition (EMD). Then, the wafers were etched in HF/H2O2 solution for 15 min at 50 °C. The damage was previously introduced in silicon wafers by phosphorus implantation. Different damage levels were obtained by varying the dose and the energy of phosphorus ions implantation. The morphological and optical properties were studied using scanning electron microscope (SEM), spectroscopy of photoluminescence and reflectance.
|Additional Information:||Selected papers from the NMDT-NGPC, New Materials Design Technology for the Next Generation of Performed Components|
|Uncontrolled Keywords:||Silicon nanowires; Electroless etching; Crystalline damage; Ion implantation|
|Subjects:||Material Science > Nanostructured materials|
|Deposited On:||08 Jun 2010 16:44|
|Last Modified:||08 Jun 2010 16:44|
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