Mohammad, M. A. and Dew, S. K. and Westra, K. and Li, P. and Aktary, M. and Lauw, Y. and Kovalenko, A. and Stepanova, M. (2007) Nanoscale resist morphologies of dense gratings using electron-beam lithography. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 25 (3). pp. 745-753.
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The authors report a systematic investigation, both by experiment and by numerical modeling, of resolution limits for dense nanoscale gratings fabricated in polymethylmethacrylate through low-energy electron-beam lithography (EBL) using 10 keV electrons. In particular, they have studied the resist morphologies that develop in various exposure regimes for gratings with periods from 20 to 100 nm and categorized the potential sources of resist damage in such gratings. Through comparison of their experimental and numerical results, they have elucidated the major mechanisms that limit the EBL process resolution at the stages of exposure and resist development. The authors have also suggested semiempirical criteria to predict the risk of resist damage when fabricating dense nanostructures.
|Subjects:||Technology > Manufacturing processes for nanotechnology|
Material Science > Nanostructured materials
|Deposited By:||INVALID USER|
|Deposited On:||05 Dec 2008 16:34|
|Last Modified:||27 May 2009 14:50|
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