Borgström, Magnus T. and Wallentin, Jesper and Trägårdh, Johanna and Ramvall, Peter and Ek, Martin and Wallenberg, L. Reine and Samuelson, Lars and Deppert, Knut (2010) In situ etching for total control over axial and radial nanowire growth. Nano Research, 3 (4). pp. 264-270.
|PDF - Published Version|
We report a method using in situ etching to decouple the axial from the radial nanowire growth pathway, independent of other growth parameters. Thereby a wide range of growth parameters can be explored to improve the nanowire properties without concern of tapering or excess structural defects formed during radial growth. We demonstrate the method using etching by HCl during InP nanowire growth. The improved crystal quality of etched nanowires is indicated by strongly enhanced photoluminescence as compared to reference nanowires obtained without etching.
|Uncontrolled Keywords:||MOVPE - nanowire growth - in situ etching - photoluminescence|
|Subjects:||Material Science > Nanofabrication processes and tools|
Material Science > Nanostructured materials
|Deposited By:||Lesley Tobin|
|Deposited On:||27 Aug 2010 14:29|
|Last Modified:||27 Aug 2010 14:29|
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