Nano Archive

In situ etching for total control over axial and radial nanowire growth

Borgström, Magnus T. and Wallentin, Jesper and Trägårdh, Johanna and Ramvall, Peter and Ek, Martin and Wallenberg, L. Reine and Samuelson, Lars and Deppert, Knut (2010) In situ etching for total control over axial and radial nanowire growth. Nano Research, 3 (4). pp. 264-270.

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We report a method using in situ etching to decouple the axial from the radial nanowire growth pathway, independent of other growth parameters. Thereby a wide range of growth parameters can be explored to improve the nanowire properties without concern of tapering or excess structural defects formed during radial growth. We demonstrate the method using etching by HCl during InP nanowire growth. The improved crystal quality of etched nanowires is indicated by strongly enhanced photoluminescence as compared to reference nanowires obtained without etching.

Item Type:Article
Uncontrolled Keywords:MOVPE - nanowire growth - in situ etching - photoluminescence
Subjects:Material Science > Nanofabrication processes and tools
Material Science > Nanostructured materials
ID Code:8817
Deposited By:Lesley Tobin
Deposited On:27 Aug 2010 14:29
Last Modified:27 Aug 2010 14:29

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