Nano Archive

Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices

Bao, Wenzhong and Liu, Gang and Zhao, Zeng and Zhang, Hang and Yan, Dong and Deshpande, Aparna and LeRoy, Brian and Lau, Chun Ning (2010) Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices. Nano Research, 3 (2). pp. 98-102.

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Abstract

We present a lithography-free technique for fabrication of clean, high quality graphene devices. This technique is based on evaporation through hard Si shadow masks, and eliminates contaminants introduced by lithographical processes. We demonstrate that devices fabricated by this technique have significantly higher mobility values than those obtained by standard electron beam lithography. To obtain ultra-high mobility devices, we extend this technique to fabricate suspended graphene samples with mobilities as high as 120 000 cm2/(V·s).

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
ID Code:8807
Deposited By:CSMNT
Deposited On:25 Aug 2010 11:37
Last Modified:25 Aug 2010 11:37

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