Bao, Wenzhong and Liu, Gang and Zhao, Zeng and Zhang, Hang and Yan, Dong and Deshpande, Aparna and LeRoy, Brian and Lau, Chun Ning (2009) Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices. Nano Research, 3 (2). pp. 98-102.
Official URL: http://www.springerlink.com/content/w151165k13tl6j...
We present a lithography-free technique for fabrication of clean, high quality graphene devices. This technique is based on evaporation through hard Si shadow masks, and eliminates contaminants introduced by lithographical processes. We demonstrate that devices fabricated by this technique have significantly higher mobility values than those obtained by standard electron beam lithography. To obtain ultra-high mobility devices, we extend this technique to fabricate suspended graphene samples with mobilities as high as 120 000 cm2/(V·s).
|Subjects:||Physical Science > Nanophysics|
Physical Science > Nano objects
Material Science > Nanochemistry
Material Science > Nanostructured materials
|Divisions:||Faculty of Engineering, Science and Mathematics > School of Physics|
Faculty of Engineering, Science and Mathematics > School of Chemistry
|Deposited On:||05 Oct 2010 08:13|
|Last Modified:||05 Oct 2010 08:13|
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