Kim, Soon-Gil and Terashi, Yoshitake and Purwanto, Agus and Okuyama, Kikuo (2009) Synthesis and film deposition of Ni nanoparticles for base metal electrode applications. COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, 337 (1-3). 96 -107 . ISSN 0066-4804
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This paper describes the preparation of Ni thin films for base metal electrode applications using Ni nanoparticles that were synthesized by thermal decomposition of a Ni-oleate complex under inert gas flow. The oleate molecules both retarded particle growth and prevented oxidation. The mean particle sizes of the cubic phase Ni nanoparticles synthesized at decomposition temperatures of 350, 380, and 400 degrees C were 5.1, 5.5, and 6.6 nm, respectively. The average activation energy for Ni nanoparticle formation was 157.51 +/- 13 kJ mol(-1), revealing a single kinetic mechanism. After formulation of a moveable paste, the Ni nanoparticles were well-dispersed on a silicon wafer using a spin coater. The deposited Ni films were further investigated for sintering behavior. Based on the cross-sectional images, the thickness of the as-deposited Ni film was 2.5 mu m, while the film sintered at 800 degrees C was 1-mu m thick. The sintered Ni films had a high continuity, without any cracks or voids. The bulk resistivity of the Ni film sintered at 800 degrees C was 1.8 x 10(-5) Omega cm. (c) 2008 Elsevier B.V. All rights reserved.
|Subjects:||Physical Science > Nanophysics|
Material Science > Nanochemistry
|Deposited On:||10 Feb 2010 13:48|
|Last Modified:||10 Feb 2010 13:48|
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