Nano Archive

Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices

Bao, Wenzhong and Liu, Gang and Zhao, Zeng and Zhang, Hang and Yan, Dong and Deshpande, Aparna and LeRoy, Brian and Lau, Chun Ning (2010) Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices. Nano Research, 3 (2). pp. 98-102.

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Abstract

We present a lithography-free technique for fabrication of clean, high quality graphene devices. This technique is based on evaporation through hard Si shadow masks, and eliminates contaminants introduced by lithographical processes. We demonstrate that devices fabricated by this technique have significantly higher mobility values than those obtained by standard electron beam lithography. To obtain ultra-high mobility devices, we extend this technique to fabricate suspended graphene samples with mobilities as high as 120 000 cm2/(V·s).

Item Type:Article
Subjects:Physical Science > Nanophysics
Physical Science > Nano objects
Material Science > Nanochemistry
Material Science > Nanostructured materials
Divisions:Faculty of Engineering, Science and Mathematics > School of Physics
Faculty of Engineering, Science and Mathematics > School of Chemistry
ID Code:8229
Deposited By:JNCASR
Deposited On:10 Feb 2010 09:11
Last Modified:16 Feb 2010 05:06

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