Nano Archive

3D Simulation of Nano-Imprint Lithography

Marín, Jose Manuel Román and Rasmussen, Henrik Koblitz and Hassager, Ole (2009) 3D Simulation of Nano-Imprint Lithography. Nanoscale Research Letters, 5 (2). pp. 274-278. ISSN 1931-7573 (Print) 1556-276X (Online)

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A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have followed the line initiated by de Gennes, using a Molecular Stress Function model of the Doi and Edwards type. We have used a 3D Lagrangian Galerkin finite element methods implemented on a parallel computer architecture. In a Lagrangian techniques, the node point follows the particle movement, allowing for the movement of free surfaces or interfaces. We have extended the method to handle the dynamic movement of the contact line between the polymer melt and stamp during mold filling.

Item Type:Article
Uncontrolled Keywords:NIL - Nano-imprint - Finite element - Lagrangian - Viscoelastic - MSF
Subjects:Material Science > Functional and hybrid materials
Material Science > Nanofabrication processes and tools
Material Science > Nanostructured materials
ID Code:8169
Deposited By:Lesley Tobin
Deposited On:21 Jan 2010 15:20
Last Modified:21 Jan 2010 15:20

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