Nano Archive

Preparation and characterization of boron thin film on iron substrate

Rehana, I. and Muhammad, D. and Ahmed, S. and Akhter, J. I. (2007) Preparation and characterization of boron thin film on iron substrate. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 23 (4). pp. 481-486. ISSN 1005-0302

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Abstract

he adherent thermal layering was undertaken by chemical vapor deposition (CVD) method using saturated solution of boric acid in ultra pure CH3OH. The influence of temperature was studied by varying temperature from 100 to 600 degrees C during the process of boron deposition. The most optimum temperature was found to be 200 degrees C. The effect of time span was observed from 6 to 120 h. The generation of micro or nano-scale thickness could be achieved by reducing time span of the experiment. The behavior of CVD was characterized by using scanning electron microscope, absorbance spectrohotometer and atomic emission spectrograph.

Item Type:Article
Subjects:Physical Science > Nanophysics
Physical Science > Nano objects
Material Science > Nanostructured materials
Material Science > Nanochemistry
Divisions:Faculty of Engineering, Science and Mathematics > School of Physics
Faculty of Engineering, Science and Mathematics > School of Chemistry
ID Code:7723
Deposited By:JNCASR
Deposited On:14 Nov 2009 08:43
Last Modified:14 Nov 2009 08:43

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