Losurdo, Maria and Bergmair, Michael and Bruno, Giovanni and Cattelan, Denis and Cobet, Christoph and Martino, Antonello and Fleischer, Karsten and Dohcevic-Mitrovic, Zorana and Esser, Norbert and Galliet, Melanie and Gajic, Rados and Hemzal, Dušan and Hingerl, Kurt and Humlicek, Josef and Ossikovski, Razvigor and Popovic, Zoran V. and Saxl, Ottilia (2009) Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives. Journal of Nanoparticle Research, 11 (7). pp. 1521-1554. ISSN 1388-0764 (Print) 1572-896X (Online)
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Official URL: http://www.springerlink.com/content/7409812755jn74...
This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measurement and analysis of nanometric films, metal nanoparticles and nanowires, semiconductor nanocrystals, and submicron periodic structures. We show that ellipsometry is capable of more than the determination of thickness and optical properties, and it can be exploited to gain information about process control, geometry factors, anisotropy, defects, and quantum confinement effects of nanostructures.
|Uncontrolled Keywords:||Spectroscopic ellipsometry - Polarimetry - Nanomaterials - Nanoparticles - Thin films - Optical characterization - Nanometrology - Review|
|Subjects:||Material Science > Functional and hybrid materials|
Analytical Science > Metrology and standards in nanotechnology
Material Science > Soft materials
|Deposited By:||Lesley Tobin|
|Deposited On:||13 Nov 2009 17:20|
|Last Modified:||13 Nov 2009 17:20|
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