Nano Archive

Ellipsometry as a high-precision technique for subnanometer-resolved monitoring of thin-film structures

Shvets, V. and Spesivtsev, E. and Rykhlitskii, S. and Mikhailov, N. (2009) Ellipsometry as a high-precision technique for subnanometer-resolved monitoring of thin-film structures. Nanotechnologies in Russia, 4 . pp. 201-214.

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Official URL: http://dx.doi.org/10.1134/S1995078009030082

Abstract

The prospects for using optical ellipsometry in advanced nanotechnologies and scientific experiments are discussed. The most important feature of the technique is that there is no perturbing influence on the system to be studied. In combination with its high sensitivity, this feature makes the technique attractive for a number of uses in different fields of knowledge, such as the physics of semiconductors, the physics and chemistry of surfaces, material science, chemistry, biology, etc. A number of modern models of ellipsometers engineered and produced at the Institute of Semiconductor Physics, Siberian Division, Russian Academy of Sciences, are presented. These instruments are based on the new patented static arrangement for ellipsometric measurements. The potential of the instruments is demonstrated by the examples of ellipsometric studies aimed at solving a number of scientific problems and by the example of applying ellipsometry to the technology of growing photosensitive Cd x Hg1 − x Te semiconductor heterostructures.

Item Type:Article
Additional Information:10.1134/S1995078009030082
ID Code:7600
Deposited By:Prof. Alexey Ivanov
Deposited On:11 Nov 2009 07:53
Last Modified:11 Nov 2009 08:00

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