Nano Archive

Fabrication of nano-crystalline porous silicon on Si substrates by a plasma enhanced hydrogenation technique

Abdi , Y. and Hashemi , P. and Karbassian , F. and Nayeri, F. D. and Behnam, A. and Mohajerzadeh, S. and Koohsorhki , J. and Robertson , M. D. and Arzi , E. (2005) Fabrication of nano-crystalline porous silicon on Si substrates by a plasma enhanced hydrogenation technique. Amorphous and Nanocrystalline Silicon Science and Technology-2005, 862 . pp. 393-398. ISSN 0272-9172

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Abstract

A novel plasma hydrogenation method for the fabrication of nano-crystalline structures of silicon as well as the photoluminescence and structural properties of these porous structures is presented. We have observed that the hydrogenation process followed by an annealing treatment results in the formation of nano-crystal line silicon structures where increased temperatures during hydrogenation reduces the grain size. Furthermore, by increasing the time of the hydrogenation process, the density of the silicon grains is increased. Photoluminescence (PL) spectroscopy demonstrated the presence of a direct gap in the visible light range where materials with a smaller grain size emitted light at lower wavelengths, and a higher density of grains resulted in higher amplitudes in the PL spectrum. TEM and SEM characterization of these samples and the structure-emission relationship are also presented.

Item Type:Article
Subjects:Physical Science > Nanophysics
Physical Science > Nano objects
Material Science > Nanostructured materials
Material Science > Nanochemistry
Divisions:Faculty of Engineering, Science and Mathematics > School of Physics
Faculty of Engineering, Science and Mathematics > School of Chemistry
ID Code:7285
Deposited By:JNCASR
Deposited On:28 Oct 2009 09:41
Last Modified:28 Oct 2009 09:41

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