Mohanty, Bhaskar Chandra and Murty, B. S. and Vijayan, V. and Kasiviswanathan, S. (2006) Atomic force microscopy study of thermal stability of silver selenide thin films grown on silicon. Applied Surface Science, 252 (22). pp. 7975-7982. ISSN 0169-4332
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http://www.sciencedirect.com/science?_ob=ArticleUR...
Abstract
Silver selenide thin films were grown on,silicon substrates by the solid-state reaction of sequentially deposited Se and Ag films of suitable thickness. Transmission electron microscopy and particle-induced X-ray emission studies of the as-deposited films showed the formation of single phase polycrystalline silver selenide from the reaction of Ag and Se films. Atomic force microscopy images of the as-deposited and films annealed at different temperatures in argon showed the film morphology to evolve into an agglomerated state with annealing temperature. The results indicate that when annealed above 473 K, silver selenide films on silicon become unstable and agglomerate through holes generated at grain boundaries. (c) 2005 Elsevier B.V. All rights reserved.
| Item Type: | Article |
|---|---|
| Subjects: | Physical Science > Nanophysics Physical Science > Nano objects Material Science > Nanochemistry Material Science > Nanostructured materials |
| Divisions: | Faculty of Engineering, Science and Mathematics > School of Physics Faculty of Engineering, Science and Mathematics > School of Chemistry |
| ID Code: | 7098 |
| Deposited By: | JNCASR |
| Deposited On: | 02 Sep 2009 10:27 |
| Last Modified: | 02 Sep 2009 10:27 |
Repository Staff Only: item control page

