Dryakhlushin, V. F. and Klimov, A. Yu. and Rogov, V. V. and Shashkin, V. I. and Sukhodoev, L. V. and Volgunov, D. G. and Vostokov, N. V. (2000) Development of contact scanning probe lithography methods for the fabrication of lateral nano-dimensional elements. Nanotechnology, 11 (3). pp. 188-191.
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Official URL: http://stacks.iop.org/0957-4484/11/188
A method of contact scanning probe lithography has been developed to enable fabrication of elements with characteristic dimensions of about 50~nm. The method involves deposition of a thin-film two-layer polymer-metal mask coating, mechanical or thermal nonplastic deformation of the top metal layer with a probe microscope, the transfer of the pattern through the polymer by means of dry etching and the formation of various nanoelements through this prepared mask. The method is applicable to any materials relevant to the formation of different nanometre objects - both metal and dielectric - on their surface.
|Subjects:||Physical Science > Nano objects|
|Deposited By:||Prof. Alexey Ivanov|
|Deposited On:||03 Dec 2008 23:42|
|Last Modified:||19 Feb 2009 18:01|
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