Nano Archive

Effecting of oxygen and chlorine on nano-structured TiN/Si3N4 films hardness

Dayan, Ma and Shengli, Ma and Kewei, Xu and Veprek, S (2005) Effecting of oxygen and chlorine on nano-structured TiN/Si3N4 films hardness. Materials Letters, 59 (7). 838 - 841.

Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.

Official URL:


Using direct current plasma-enhanced chemical vapor deposition (PECVD) techniques, the nanocomposite coatings of nc-TiN/a-Si3N4 were deposited on stainless steel substrates. The coatings were characterized by nano-indentation, elastic recoil detection spectroscopy (ERD), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM). The effects of oxygen and chlorine were investigated in this paper. A certain content of oxygen and chlorine can strongly decrease the hardness of superhard of nc-TiN/a-Si3N4. It is shown that 1–1.5 at.% of oxygen causes a decrease in hardness decrease to a value of about 30 GPa as compared to 45–55 GPa for a the that of below 0.2 at.% oxygen.

Item Type:Article
Uncontrolled Keywords:nc-TiN/a-Si3N4; Superhard; Oxygen; Chlorine
Subjects:Material Science > Nanofabrication processes and tools
Material Science > Nanochemistry
Material Science > Nanostructured materials
ID Code:6862
Deposited By:SPI
Deposited On:25 Sep 2009 16:45
Last Modified:25 Sep 2009 16:45

Repository Staff Only: item control page