Dayan, Ma and Shengli, Ma and Kewei, Xu and Veprek, S (2005) Effecting of oxygen and chlorine on nano-structured TiN/Si3N4 films hardness. Materials Letters, 59 (7). 838 - 841.
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Official URL: http://www.sciencedirect.com/science/article/B6TX9...
Abstract
Using direct current plasma-enhanced chemical vapor deposition (PECVD) techniques, the nanocomposite coatings of nc-TiN/a-Si3N4 were deposited on stainless steel substrates. The coatings were characterized by nano-indentation, elastic recoil detection spectroscopy (ERD), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM). The effects of oxygen and chlorine were investigated in this paper. A certain content of oxygen and chlorine can strongly decrease the hardness of superhard of nc-TiN/a-Si3N4. It is shown that 1–1.5 at.% of oxygen causes a decrease in hardness decrease to a value of about 30 GPa as compared to 45–55 GPa for a the that of below 0.2 at.% oxygen.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | nc-TiN/a-Si3N4; Superhard; Oxygen; Chlorine |
| Subjects: | Material Science > Nanofabrication processes and tools Material Science > Nanochemistry Material Science > Nanostructured materials |
| ID Code: | 6862 |
| Deposited By: | SPI |
| Deposited On: | 25 Sep 2009 16:45 |
| Last Modified: | 25 Sep 2009 16:45 |
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