Mishra, S. K. and Pathak, L. C. (2005) Deposition of crystalline C-N film by arc evaporation process. Materials Letters, 59 (27). 3481 - 3484.
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Crystalline carbon nitride thin films were deposited by Arc evaporation process. The room temperature deposited films showed amorphous and polycrystalline phases whereas, the films were crystalline, when deposited at 300 °C. These films were nano-crystalline and had grain sizes varying from 5 to 30 nm depending on the deposition condition. The average C : N at.% ratio for films deposited at 300 °C substrate temperature was found as C : N :: 39.37 : 59.87. The microhardness of the deposited films were in the range of 2200Hv.015 to 1800Hv.015.
|Uncontrolled Keywords:||Carbon nitride; Arc evaporation; Hard coatings|
|Subjects:||Material Science > Nanostructured materials|
|Deposited On:||30 Sep 2009 17:57|
|Last Modified:||30 Sep 2009 17:57|
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