Nano Archive

Characterization of nano-structured TiN thin films prepared by R.F. magnetron sputtering

Kim, Taek-Soo and Park, Sang-Shik and Lee, Byong-Taek (2005) Characterization of nano-structured TiN thin films prepared by R.F. magnetron sputtering. Materials Letters, 59 (29-30). 3929 - 3932.

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Official URL: http://www.sciencedirect.com/science/article/B6TX9...

Abstract

TiN thin films were deposited on Si substrate using an R.F. sputter as a function of Ar / N2 ratio of 20 : 30, 10 :3 0 and 0 : 30. The average thickness of thin film was 0.7 μm, while the size of TiN nano-particles dispersed in the matrix was 510 nm in diameter. The microstructure became fine as the flow rate of N2 to Ar gas increased. The hardness and elastic modulus measured by a nanoindentation method were also enhanced. It discussed the fracture pattern took placed at the TiN layer during the indentation.

Item Type:Article
Uncontrolled Keywords:TiN thin film; R.F. sputtering; Nanoindentation; Nanostructures
Subjects:Material Science > Nanofabrication processes and tools
Material Science > Nanostructured materials
ID Code:6834
Deposited By:SPI
Deposited On:01 Oct 2009 17:27
Last Modified:01 Oct 2009 17:27

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