Nano Archive

Nano-aluminum-induced crystallization of amorphous silicon

Zou, Min and Cai, Li and Wang, Hengyu and Brown, William (2006) Nano-aluminum-induced crystallization of amorphous silicon. Materials Letters, 60 (11). 1379 - 1382.

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Official URL: http://www.sciencedirect.com/science/article/B6TX9...

Abstract

This paper reports the successful fabrication of smooth, polycrystalline silicon films with very large crystallites produced by nanometer thick aluminum-induced crystallization (AIC) of plasma-enhanced chemical vapor deposited (PECVD) amorphous silicon (a-Si:H) and the effect of annealing temperature ramp up time on grain size. The study shows that, compared to traditional AIC, nano-AIC produces much smoother polycrystalline silicon films with very large crystallites. In addition, unlike traditional AIC, the grain sizes produced by nano-AlC increase considerably with annealing temperature ramp-up time.

Item Type:Article
Uncontrolled Keywords:Amorphous; Silicon; Crystallization; Aluminum; Nanometer
Subjects:Material Science > Nanostructured materials
ID Code:6807
Deposited By:SPI
Deposited On:06 Feb 2010 11:41
Last Modified:06 Feb 2010 11:41

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