Huang, Z. H. and Yang, B and Liu, C. S. and Guo, L. P. and Fan, X. J. and Fu, D. J. (2007) Effect of annealing on the composition, structure and mechanical properties of carbon nitride films deposited by middle-frequency magnetron sputtering. Materials Letters, 61 (16). 3443 - 3445.
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Carbon nitride films were deposited by middle-frequency reactive magnetron sputtering and annealed at different temperatures in nitrogen ambient. X-ray photoelectron spectroscopy, Raman scattering, transmission electron microscopy, and nano-indenter were used to characterize the as-deposited and annealed films. The analysis showed that annealing resulted in the dissociation of N and C in the films. The dissociation of C happened after 500 °C and lagged behind that of N. With the increase of annealing temperature, the disorder of sp2 C decreased and the films were gradually graphitized. The microstructure changed from amorphous to fullerene-like CNx with the annealing temperature increasing to 500 °C, and then to nitridized graphite nanocrystals at 600 °C. The graphitization resulted in a drastic decreasing of hardness and modulus of the films.
|Uncontrolled Keywords:||Carbon nitride; Thermal properties; Nanocrystal; Microstructure; Hardness|
|Subjects:||Material Science > Nanostructured materials|
|Deposited On:||09 Feb 2010 12:24|
|Last Modified:||09 Feb 2010 12:24|
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