Nano Archive

Effect of annealing on the composition, structure and mechanical properties of carbon nitride films deposited by middle-frequency magnetron sputtering

Huang, Z. H. and Yang, B and Liu, C. S. and Guo, L. P. and Fan, X. J. and Fu, D. J. (2007) Effect of annealing on the composition, structure and mechanical properties of carbon nitride films deposited by middle-frequency magnetron sputtering. Materials Letters, 61 (16). 3443 - 3445.

Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.

Official URL: http://www.sciencedirect.com/science/article/B6TX9...

Abstract

Carbon nitride films were deposited by middle-frequency reactive magnetron sputtering and annealed at different temperatures in nitrogen ambient. X-ray photoelectron spectroscopy, Raman scattering, transmission electron microscopy, and nano-indenter were used to characterize the as-deposited and annealed films. The analysis showed that annealing resulted in the dissociation of N and C in the films. The dissociation of C happened after 500 °C and lagged behind that of N. With the increase of annealing temperature, the disorder of sp2 C decreased and the films were gradually graphitized. The microstructure changed from amorphous to fullerene-like CNx with the annealing temperature increasing to 500 °C, and then to nitridized graphite nanocrystals at 600 °C. The graphitization resulted in a drastic decreasing of hardness and modulus of the films.

Item Type:Article
Uncontrolled Keywords:Carbon nitride; Thermal properties; Nanocrystal; Microstructure; Hardness
Subjects:Material Science > Nanostructured materials
ID Code:6717
Deposited By:SPI
Deposited On:09 Feb 2010 12:24
Last Modified:09 Feb 2010 12:24

Repository Staff Only: item control page