Noach, Salman and Manevich, Michael and Eisenberg, Naftali P. and Fokin, Evgeny P. and Mihalina, Tatiana V. (2005) Optical near-field and thermal nanolithography using organic dry developing photoresist. Nanotechnology, 16 (6). pp. 775-778.
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Official URL: http://stacks.iop.org/0957-4484/16/775
Abstract
A combination of new organic photoresist films based on naphthoquinone with a conventional AFM using a tapered fibre tip as a near-field source enables the development of 'real time' dry process nano-lithography. The methodology of the adaptation of these films as well as the system configuration for a nano-scale fabrication will be described. Using these materials the exposure can be performed either by the optical near field or nano-thermal effect to achieve positive or negative lithography. Sub-wavelength gratings fabricated using this system with a variable line width down to 45~nm will be demonstrated.
| Item Type: | Article |
|---|---|
| ID Code: | 664 |
| Deposited By: | Prof. Alexey Ivanov |
| Deposited On: | 16 Mar 2009 10:41 |
| Last Modified: | 26 Mar 2009 14:17 |
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