Nano Archive

Optical near-field and thermal nanolithography using organic dry developing photoresist

Noach, Salman and Manevich, Michael and Eisenberg, Naftali P. and Fokin, Evgeny P. and Mihalina, Tatiana V. (2005) Optical near-field and thermal nanolithography using organic dry developing photoresist. Nanotechnology, 16 (6). pp. 775-778.

Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.

Official URL: http://stacks.iop.org/0957-4484/16/775

Abstract

A combination of new organic photoresist films based on naphthoquinone with a conventional AFM using a tapered fibre tip as a near-field source enables the development of 'real time' dry process nano-lithography. The methodology of the adaptation of these films as well as the system configuration for a nano-scale fabrication will be described. Using these materials the exposure can be performed either by the optical near field or nano-thermal effect to achieve positive or negative lithography. Sub-wavelength gratings fabricated using this system with a variable line width down to 45~nm will be demonstrated.

Item Type:Article
ID Code:664
Deposited By:Prof. Alexey Ivanov
Deposited On:16 Mar 2009 10:41
Last Modified:26 Mar 2009 14:17

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