Nano Archive

Metallization for crossbar molecular devices

Deng, J. and Hofbauer, W. and Chandrasekhar, N. and O'Shea, S. J. (2007) Metallization for crossbar molecular devices. NANOTECHNOLOGY, 18 (15).

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Official URL: http://www.iop.org/EJ/abstract/0957-4484/18/15/155...

Abstract

Self-assembled organic monolayer nanopore crossbar junctions were fabricated as a test structure for molecular electronics. The device yield, which is typically very low due to electrical shorting on top electrode deposition, is studied for different deposition parameters, and a clear improvement ( up to 45% yield) is obtained by indirect deposition of silver electrodes on cooled substrates. Nevertheless, the yield fluctuates strongly from run to run (similar to 8% to similar to 45%), implying that reliable device fabrication remains challenging. We find a small number of devices (< 1%) show switching behaviour in conductivity, presumably due to metal filaments.

Item Type:Article
Uncontrolled Keywords:NEGATIVE DIFFERENTIAL RESISTANCE; NANOIMPRINT LITHOGRAPHY; GOLD ELECTRODES; MONOLAYER; FABRICATION; CONDUCTANCE; RECTIFICATION; JUNCTIONS
Subjects:Material Science > Nanofabrication processes and tools
ID Code:6378
Deposited By:IoN
Deposited On:28 Sep 2009 10:11
Last Modified:28 Sep 2009 10:11

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