Carbone, D. and Alija, A. and Plantevin, O. and Gago, R. and Facsko, S. and Metzger, T. H. (2008) Early stage of ripple formation on Ge(001) surfaces under near-normal ion beam sputtering. NANOTECHNOLOGY, 19 (3).
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http://www.iop.org/EJ/abstract/0957-4484/19/3/0353...
We present a study of the early stage of ripple formation on Ge(001) surfaces irradiated by a 1 keV Xe+ ion beam at room temperature and near-normal incidence. A combination of a grazing incidence x-ray scattering technique and atomic force microscopy allowed us to observe a variation of the symmetry of the surface nanopattern upon increase of the ion fluence. The isotropic dot pattern formed during the first minutes of sputtering evolves into an anisotropic ripple pattern for longer sputtering time. These results provide a new basis for further steps in the theoretical description of the morphology evolution during ion beam sputtering.
|Subjects:||Analytical Science > Microscopy and probe methods|
Physical Science > Nanophysics
Material Science > Nanofabrication processes and tools
Technology > Manufacturing processes for nanotechnology
Material Science > Nanostructured materials
|Deposited On:||09 Dec 2009 12:26|
|Last Modified:||09 Dec 2009 12:26|
Repository Staff Only: item control page