Nano Archive

Durable diamond-like carbon templates for UV nanoimprint lithography

Tao, L. and Ramachandran, S. and Nelson, C. T. and Lin, M. and Overzet, L. J. and Goeckner, M. and Lee, G. and Willson, C. G. and Wu, W. and Hu, W. (2008) Durable diamond-like carbon templates for UV nanoimprint lithography. NANOTECHNOLOGY, 19 (10).

Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.

Official URL: http://www.iop.org/EJ/abstract/0957-4484/19/10/105...

Abstract

The interaction between resist and template during the separation process after nanoimprint lithography ( NIL) can cause the formation of defects and damage to the templates and resist patterns. To alleviate these problems, fluorinated self-assembled monolayers (F-SAMs, i.e. tridecafluoro-1,1,2,2, tetrahydrooctyl trichlorosilane or FDTS) have been employed as template release coatings. However, we find that the FDTS coating undergoes irreversible degradation after only 10 cycles of UV nanoimprint processes with SU-8 resist. The degradation includes a 28% reduction in surface F atoms and significant increases in the surface roughness. In this paper, diamond-like carbon (DLC) films were investigated as an alternative material not only for coating but also for direct fabrication of nanoimprint templates. DLC films deposited on quartz templates in a plasma enhanced chemical vapor deposition system are shown to have better chemical and physical stability than FDTS. After the same 10 cycles of UV nanoimprints, the surface composition as well as the roughness of DLC films were found to be unchanged. The adhesion energy between the DLC surface and SU-8 is found to be smaller than that of FDTS despite the slightly higher total surface energy of DLC. DLC templates with 40 nm features were fabricated using e-beam lithography followed by Cr lift-off and reactive ion etching. UV nanoimprinting using the directly patterned DLC templates in SU-8 resist demonstrates good pattern transfer fidelity and easy template-resist separation. These results indicate that DLC is a promising material for fabricating durable templates for UV nanoimprint lithography.

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
Technology > Manufacturing processes for nanotechnology
Physical Science > Nanoelectronics
Physical Science > Photonics
ID Code:6315
Deposited By:IoN
Deposited On:16 Dec 2009 16:56
Last Modified:16 Dec 2009 16:56

Repository Staff Only: item control page