Nano Archive

High resolution radially symmetric nanostructures from simultaneous electron beam induced etching and deposition

Lobo, Charlene J. and Toth, Milos and Wagner, Raymond and Thiel, Bradley L. and Lysaght, Michael (2008) High resolution radially symmetric nanostructures from simultaneous electron beam induced etching and deposition. NANOTECHNOLOGY, 19 (2).

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Abstract

Electron beam induced etching (EBIE) and deposition (EBID) are promising fabrication techniques in which an electron beam is used to dissociate surface-adsorbed precursor molecules to achieve etching or deposition. Spatial resolution is normally limited by the electron flux distribution at the substrate surface. Here we present simultaneous EBIE and EBID (EBIED) as a method for surpassing this resolution limit by using adsorbate depletion to induce etching and deposition in adjacent regions within the electron flux profile. Our simulation results indicate the possibility of growth control of radially symmetric nanostructures at the sub-1 nm length scale on bulk substrates. The technique is well suited to the fabrication of ring-shaped nanostructures such as those employed in plasmonics, sensing devices, magneto-optics and magnetoelectronics.

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
ID Code:6277
Deposited By:IoN
Deposited On:10 Sep 2009 12:05
Last Modified:10 Sep 2009 12:05

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