Nano Archive

Control of ruthenium oxide nanorod length in reactive sputtering

Cross, Michael W. and Varhue, Walter J. and Hitt, Darren L. and Adams, Edward (2008) Control of ruthenium oxide nanorod length in reactive sputtering. NANOTECHNOLOGY, 19 (4).

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Official URL: http://iopscience.iop.org/0957-4484/19/4/045611

Abstract

Ruthenium oxide nanorods have been grown on Si wafer substrates under a variety of pre-existing surface conditions by reactive radio frequency sputtering in an electron cyclotron resonant plasma process. Nanorod formation by this method is fast relative to that observed in other processes reported in the literature, with nucleation being the rate determining step. Growth in the axial direction is limited by the availability of ruthenium precursors which competes with their consumption in the lateral growth of the nanorods. The availability of Ru precursors at the top of the nanorods can be controlled by surface diffusion and therefore substrate temperature. The ultimate length of the nanorods is determined by the mole fraction of oxygen used in the reactor ambient through the production of mobile Ru hyperoxide precursors. The results of this investigation show the way to develop a process for producing a high density field of nanorods with a specified length.

Item Type:Article
Uncontrolled Keywords:Nanoscale science and low-D systems
Subjects:Physical Science > Nanophysics
Technology > Manufacturing processes for nanotechnology
Material Science > Nanostructured materials
ID Code:6155
Deposited By:IoN
Deposited On:01 Apr 2010 16:51
Last Modified:01 Apr 2010 16:51

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