Kim, Tae-il and Baek, Chang hoon and Suh, Kahp Y. and Soon-min , Seo and Lee, Hong H. (2008) Optical lithography with printed metal mask and a simple superhydrophobic surface. SMALL, 4 (2). pp. 182-185.
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http://www3.interscience.wiley.com/journal/1178870...
Abstract
A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusing by these lenses results in a significant reduction in the feature size.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | nanolenses; nanolithography; nanostructures; printing; superhydrophobicity |
| Subjects: | Material Science > Nanofabrication processes and tools |
| ID Code: | 6112 |
| Deposited By: | IoN |
| Deposited On: | 11 Sep 2009 10:25 |
| Last Modified: | 11 Sep 2009 10:25 |
Repository Staff Only: item control page
