Turchanin, Andrey and Schnietz, Mark and El-Desawy, Mohamed and Solak, Harun H. and David, Christian and Goelzhaeuser, Armin (2007) Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography. SMALL, 3 (12). pp. 2114-2119.
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http://www3.interscience.wiley.com/journal/1168349...
Extreme-UV interference lithography (EUV-IL) is applied to create chemical nanopatterns in self-assembled monolayers (SAMs) of 4-nitro-1,1-biphenyl-4-thiol (NBPT) on gold. X-ray photoelectron spectroscopy shows that EUV irradiation induces both the conversion of the terminal nitro groups of NBPT into amino groups and the lateral crosslinking of the underlying aromatic cores. Large-area (2 mm2) nitro/amino chemical patterns with periods ranging from 2000 nm to 60 nm can be generated. Regions of pristine NBPT on the exposed samples are exchanged with protein-resistant thiol SAMs of polyethyleneglycol, resulting in the formation of molecular nanotemplates, which can serve as the basis of complex biomimetic surfaces.
|Uncontrolled Keywords:||biomimetics; chemical nanopatterns; molecular engineering; nanolithography; self-assembled monolayers|
|Subjects:||Material Science > Nanofabrication processes and tools|
|Deposited On:||11 Sep 2009 09:44|
|Last Modified:||11 Sep 2009 09:44|
Repository Staff Only: item control page