Nano Archive

A direct-write single-step positive etch resist for dip-pen nanotithography

Wei, Joseph H. and Ginger, David S. (2007) A direct-write single-step positive etch resist for dip-pen nanotithography. SMALL, 3 (12). pp. 2034-2037.

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Official URL: http://www3.interscience.wiley.com/journal/1173565...

Abstract

Dip-pen nanolithography is used to deposit 1-octadecylamine (ODA) as a positive etch resist on gold substrates and then passivate the unpatterned regions with 1-octadecanethiol (ODT). Selective etching of the ODA-patterned features is achieved to generate nanoholes without the need for any electrochemical desorption steps (see image). Patterns are formed due to the faster etching rates of the ODA-patterned areas compared with the ODT-covered regions in a thiourea and ferric nitrate etching solution.

Item Type:Article
Uncontrolled Keywords:dip-pen nanolithography; microcontact printing; nanoholes; resists; self-assembled monolayers
Subjects:Material Science > Nanofabrication processes and tools
ID Code:5927
Deposited By:IoN
Deposited On:11 Sep 2009 09:48
Last Modified:11 Sep 2009 09:48

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