Lamperti, A and Bottani, C. E. and Ossi, P. M. (2005) Elemental distribution in fluorinated amorphous carbon thin films. Journal of the American Society for Mass Spectrometry, 16 (1). 126 - 131.
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Official URL: http://www.sciencedirect.com/science/article/B6TH2...
Abstract
Focused ion beam-secondary ion mass spectrometry (FIB-SIMS) with 20 nm spatial resolution has been used to analyze amorphous fluorinated carbon thin films, deposited by plasma assisted chemical vapor deposition (PACVD), at micro- to nano-scale. Mass spectra and ion imaging of film surface were acquired and the presence and distribution of contaminants were investigated. Surface images show the secondary ion distribution for F−, CH−, CF−. A change in size and topology of fluorine-rich areas is correlated with film hardness and with microstructure transition from diamond-like to polymer-like, as indicated by infrared and Raman spectroscopies. Based on the surface distributions of CF− and CH− and on the vibrational spectroscopy results, a mechanism of fluorine substitution for hydrogen and an attempt to explain the film structure and microstructure is proposed.
| Item Type: | Article |
|---|---|
| Subjects: | Material Science > Nanofabrication processes and tools Biomedical Science > Nanomedicine |
| ID Code: | 5778 |
| Deposited By: | SPI |
| Deposited On: | 23 Jul 2009 17:26 |
| Last Modified: | 23 Jul 2009 17:26 |
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