Subrahmanyam, A and Reddy , Y. B. K and Nagendra , C. L (2008) Nano-vanadium oxide thin films in mixed phase for microbolometer applications. Journal of physics. D, Applied physics, 41 (19). 195108.1-195108.6. ISSN 0022-3727
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Among the several phases of vanadium oxide, mixed phases of VO2 and V205 are preferred for uncooled micro-bolometers with low noise. The aim of this investigation is to achieve mixed phase VO2 and V2O5 thin films with nanometre grain sizes and high temperature coefficient of resistance (TCR). Since the phase depends upon the oxygen reactivity, these vanadium oxide thin films are prepared by reactive electron beam evaporation at different oxygen flow rates and substrate temperatures. The mixed phases have been evaluated through x-ray diffraction and x-ray photo emission studies. The temperature dependence of resistance has shown that the films grown at 473 K with 2.8 x 10-5 mbar chamber pressure of oxygen (VO2 V205 ratio of 36: 64) have the highest TCR of -3.2 K-1 with a reasonable low resistance (12012/square).
|Subjects:||Physical Science > Nanophysics|
Physical Science > Nano objects
Material Science > Nanochemistry
Material Science > Nanostructured materials
|Divisions:||Faculty of Engineering, Science and Mathematics > School of Physics|
Faculty of Engineering, Science and Mathematics > School of Chemistry
|Deposited On:||11 Aug 2009 07:21|
|Last Modified:||11 Aug 2009 07:21|
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