Nano Archive

Nano-vanadium oxide thin films in mixed phase for microbolometer applications

Subrahmanyam, A and Reddy, Y. Bharat Kumar and Nagendra, C. L (2008) Nano-vanadium oxide thin films in mixed phase for microbolometer applications. Journal of physics. D, 41 (6). p. 195108. ISSN 0022-3727

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Abstract

Among the several phases of vanadium oxide, mixed phases of VO2 and V2O5 are preferred for uncooled micro-bolometers with low noise. The aim of this investigation is to achieve mixed phase VO2 and V2O5 thin films with nanometre grain sizes and high temperature coefficient of resistance (TCR). Since the phase depends upon the oxygen reactivity, these vanadium oxide thin films are prepared by reactive electron beam evaporation at different oxygen flow rates and substrate temperatures. The mixed phases have been evaluated through x-ray diffraction and x-ray photo emission studies. The temperature dependence of resistance has shown that the films grown at 473K with 2.8 × 10−5 mbar chamber pressure of oxygen (VO2 : V2O5 ratio of 36 : 64) have the highest TCR of −3.2K−1 with a reasonable low resistance (120/square).

Item Type:Article
Subjects:Physical Science > Nanophysics
Physical Science > Nano objects
Divisions:Faculty of Engineering, Science and Mathematics > School of Physics
Faculty of Engineering, Science and Mathematics > School of Chemistry
ID Code:5569
Deposited By:JNCASR
Deposited On:11 Aug 2009 07:21
Last Modified:11 Aug 2009 07:21

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