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Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

Sahoo, Kartika Chandra and Lin, Men-Ku and Chang, Edward-Yi and Lu, Yi-Yao and Chen, Chun-Chi and Huang, Jin-Hua and Chang, Chun-Wei (2009) Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application. Nanoscale Research Letters, 4 (7). pp. 680-683.

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Official URL: http://www.springerlink.com/content/451k66p0876mg0...

Abstract

We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.

Item Type:Article
Subjects:Technology > Nanotechnology and energy applications
Material Science > Nanostructured materials
ID Code:5549
Deposited By:IoN
Deposited On:30 Jun 2009 10:44
Last Modified:30 Jun 2009 10:44

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