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Magnetron plasma and nanotechnology

Kashtanov, Pavel V and Smirnov, Boris M and Hippler, Rainer (2007) Magnetron plasma and nanotechnology. Physics-Uspekhi, 50 (5). pp. 455-488.

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Official URL: http://stacks.iop.org/1063-7869/50/455

Abstract

Magnetron plasma processes involving metal atoms and clusters are reviewed. The formation of metal atoms near the cathode and their nucleation in a buffer gas flow are discussed. The flow of a buffer gas with metal clusters through a magnetron chamber disturbs the equilibrium between the buffer gas flow and clusters near the exit orifice and is accompanied by cluster attachment to the chamber walls. Cluster charging far off the cathode, the disturbance of equilibrium between the buffer gas flow and cluster drift, and the attachment of charged clusters to the chamber walls -- the factors determining the output parameters of the cluster beam escaping the magnetron chamber -- are analyzed. Cluster deposition on a solid surface and on dusty plasma particles is considered.

Item Type:Article
ID Code:5325
Deposited By:Prof. Alexey Ivanov
Deposited On:06 Aug 2009 11:15
Last Modified:06 Aug 2009 11:32

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