Nano Archive

Nanoscale photolithography by means of surface plasmon interference

Doskolovich, L L and Kadomina, E A and Kadomin, I I (2007) Nanoscale photolithography by means of surface plasmon interference. Journal of Optics A: Pure and Applied Optics, 9 (10). pp. 854-857.

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We discuss a technique for obtaining surface plasmon interference patterns, which may find use in photolithography. To obtain the interference patterns we propose that a diffraction grating with a metal film coated onto the substrate should be used. The modeling results show that it is possible to produce a high-contrast interference pattern. The grating period can be several times that of the interference pattern produced. The electric field energy density in interference maxima is tens of times that of the incident wave.

Item Type:Article
ID Code:5287
Deposited By:Prof. Alexey Ivanov
Deposited On:06 Aug 2009 11:24
Last Modified:06 Aug 2009 11:32

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