Nano Archive

Fabrication of nano-structures using inverse-[mu]CP technique with a flat PDMS stamp

Kim, Beomjoon and Kim, Janggil and Takama, Nobuyuki (2007) Fabrication of nano-structures using inverse-[mu]CP technique with a flat PDMS stamp. Sensors and Actuators A: Physical, 136 (1). 475 - 483.

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Here, a new technology for uniform nano-patterning in a wide area is introduced. A μCP technique is applied in the opposite way of a traditional method. Using a flat PDMS stamp, sub-mm scale dot features of alkanethiol SAM are patterned onto rigid tips of micro Si structures, which deforms much less than those of PDMS structures. In order to minimize the diffusion of SAM ink in μCp process, the position of a stamp and a substrate is reversely changed, i.e., the Si substrate with micro structures is stamped onto the flat PDMS stamp which is placed on the bottom. Consequently, millions of nano dot features are uniformly patterned on the top of Si structures in a wide area (12 mm × 12 mm). As one application, millions of uniform nano-needles array is fabricated in a large area using a nano-scale metal mask fabricated by inverse-μCP. Besides, this inverse-μCP technique will show another possibility to the nano-fabrication for bio-MEMS technology.

Item Type:Article
Additional Information:25th Anniversary of Sensors and Actuators A: Physical
Uncontrolled Keywords:Inverse micro contact printing (inverse-μCP); Self-assembled monolayer; Flat PDMS stamp; Nano-patterning; Nano-fabrication; Nano-needles
Subjects:Material Science > Nanofabrication processes and tools
Analytical Science > Nanotechnology for sensing and actuating
Biomedical Science > Nanobiotechnology
ID Code:4858
Deposited By:SPI
Deposited On:27 Apr 2009 10:15
Last Modified:27 Apr 2009 10:15

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