Nano Archive

Frequency stability of wafer-scale film encapsulated silicon based MEMS resonators

Kim, Bongsang and Candler, Rob N. and Hopcroft, Matthew A. and Agarwal, Manu and Park, Woo-Tae and Kenny, Thomas W. (2007) Frequency stability of wafer-scale film encapsulated silicon based MEMS resonators. Sensors and Actuators A: Physical, 136 (1). 125 - 131.

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The stability of resonant frequency for single wafer, thin-film encapsulated silicon MEMS resonators was investigated for both long-term operation and temperature cycling. The resonant frequencies of encapsulated resonators were periodically measured at 25 ± 0.1 °C for >9000 h, and the resonant frequency variation remained within the measurement uncertainty of 3.1 ppm and 3.8 ppm for the two designs of resonators measured. Also, the resonators were temperature cycled for 680 cycles between −50 °C and 80 °C, measuring the resonant frequency each time the temperature reached 30 °C. Again, the change in resonant frequency was seen to remain within the measurement uncertainty. This demonstrates stability of resonant frequency for both long-term operation of more than a year and large number of temperature cycles, emphasizing the stability of both the resonator and the package.

Item Type:Article
Additional Information:25th Anniversary of Sensors and Actuators A: Physical
Uncontrolled Keywords:MEMS resonator; Long-term stability; Resonant frequency stability; Encapsulation
Subjects:Analytical Science > Nanotechnology for sensing and actuating
Engineering > Nanotechnology applications in ICT
ID Code:4846
Deposited By:SPI
Deposited On:27 Apr 2009 11:04
Last Modified:27 Apr 2009 11:04

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