Li, Jianhua and Chen, Di and Zhang, Jinya and Liu, Jingquan and Zhu, Jun (2006) Indirect removal of SU-8 photoresist using PDMS technique. Sensors and Actuators A: Physical, 125 (2). 586 - 589.
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Official URL: http://www.sciencedirect.com/science/article/B6THG...
SU-8 photoresist shows superior images for thick film lithography and has been utilized as an electroplating mold. However, crosslinked SU-8 is difficult to remove reliably from high-aspect-ratio microstructures (HARMs) without damage or alteration to the electroplated metal. In this paper, an indirect SU-8 removal method is proposed. Instead of directly using SU-8 microstructure as the electroplating mold, a polydimethysiloxane (PDMS) replica is employed. The metallic micromold insert obtained through this method can be easily peeled off from the PDMS replica, meanwhile with high resolution and smooth surfaces.
|Uncontrolled Keywords:||PDMS; SU-8 removal; Electroplating; Micromold insert; SU-8|
|Subjects:||Analytical Science > Nanotechnology for sensing and actuating|
|Deposited On:||08 Apr 2009 15:15|
|Last Modified:||08 Apr 2009 15:15|
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