Nano Archive

Indirect removal of SU-8 photoresist using PDMS technique

Li, Jianhua and Chen, Di and Zhang, Jinya and Liu, Jingquan and Zhu, Jun (2006) Indirect removal of SU-8 photoresist using PDMS technique. Sensors and Actuators A: Physical, 125 (2). 586 - 589.

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SU-8 photoresist shows superior images for thick film lithography and has been utilized as an electroplating mold. However, crosslinked SU-8 is difficult to remove reliably from high-aspect-ratio microstructures (HARMs) without damage or alteration to the electroplated metal. In this paper, an indirect SU-8 removal method is proposed. Instead of directly using SU-8 microstructure as the electroplating mold, a polydimethysiloxane (PDMS) replica is employed. The metallic micromold insert obtained through this method can be easily peeled off from the PDMS replica, meanwhile with high resolution and smooth surfaces.

Item Type:Article
Uncontrolled Keywords:PDMS; SU-8 removal; Electroplating; Micromold insert; SU-8
Subjects:Analytical Science > Nanotechnology for sensing and actuating
ID Code:4676
Deposited By:SPI
Deposited On:08 Apr 2009 15:15
Last Modified:08 Apr 2009 15:15

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