T. , Bhuvana and Kulkarni, G.U. (2008) Polystyrene as a zwitter resist in electron beam lithography based electroless patterning of gold. Bull. Mater. Sci., 31 (3). pp. 201-206.
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Official URL: http://www.ias.ac.in/matersci/bmsjun2008/201.pdf
The resist action of polystyrene (Mw, 2,600,000) towards electroless deposition of gold on Si(100) surface following cross-linking by exposing to a 10 kV electron beam, has been investigated employing a scanning electron microscope equipped with electron beam lithography tool. With a low dose of electrons (21 μC/cm2), the exposed regions inhibited the metal deposition from the plating solution due to cross-linking—typical of the negative resist behaviour of polystyrene, with metal depositing only on the developed Si surface. Upon increased electron dosage (160 μC/cm2), however, Au deposition took place even in the exposed regions of the resist, thus turning it into a positive resist. Raman measurement revealed amorphous carbon present in the exposed region that promotes metal deposition. Further increase in dosage led successively to negative (220 μC/cm2) and positive (13,500 μC/cm2) resist states. The zwitter action of polystyrene resist has been exploited to create line gratings with pitch as low as 200 nm and gap electrodes down to 80 nm.
|Subjects:||Material Science > Nanofabrication processes and tools|
Material Science > Nanostructured materials
|Divisions:||Faculty of Engineering, Science and Mathematics > School of Chemistry|
|Deposited On:||03 Feb 2009 04:15|
|Last Modified:||29 Sep 2010 10:32|
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