Sun, S. Q. and Montague, M and Critchley, K and Chen, M. S. and Dressick, W. J. and Evans, S. D. and Leggett, G. J. (2006) Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenyisiloxane monolayers. NANO LETTERS, 6 (1). pp. 29-33.
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Official URL: http://pubs.acs.org/doi/abs/10.1021/nl051804l
Abstract
We demonstrate the fabrication of sub-100-nm DNA surface patterns by scanning near-field optical lithography using a near-field scanning optical microscope coupled to a UV laser and a chloromethylphenylsiloxane (CMPS) self-assembled monolayer (SAM). The process involves 244-nm exposure of the CMPS SAM to create nanoscale patterns of surface carboxylic acid functional groups, followed by their conversion to the N-hydroxysuccinimidyl ester and reaction of the active ester with DNA to spatially control DNA grafting with high selectivity.
| Item Type: | Article |
|---|---|
| Subjects: | Technology > Manufacturing processes for nanotechnology |
| ID Code: | 3845 |
| Deposited By: | SPI |
| Deposited On: | 21 Jan 2009 16:53 |
| Last Modified: | 19 Feb 2009 09:37 |
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