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Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications

Parekh, V and Chunsheng, E and Smith, D and Ruiz, A and Wolfe, JC and Ruchhoeft, P and Svedberg, E and Khizroev, S and Litvinov, D (2006) Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications. NANOTECHNOLOGY, 17 (9). pp. 2079-2082.

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Official URL: http://www.iop.org/EJ/abstract/0957-4484/17/9/001

Abstract

An approach to fabrication of a patterned magnetic recording medium for next generation data storage systems is presented. (Co/Pd)(n) magnetic multilayers are evaluated as candidates for patterned medium materials for their high and easily controllable magnetic anisotropy. The multilayer films deposited on a Ta seed layer enable high intergranular exchange coupling - an essential feature of a patterned magnetic recording medium. The quality of (Co/Pd)(n) superlattices was optimized via deposition conditions and monitored using low-angle x-ray diffraction. An estimated in-plane (hard-axis) magnetization saturation field in excess of 40 000 Oe was observed. Vertical (easy-axis) hysteresis loops for as-deposited continuous magnetic multilayers exhibited a low coercivity of 930 Oe, indicating highly uniform ( magnetically) films with weak domain wall pinning. Ion-beam proximity lithography was used to pattern magnetic multilayers into 43 nm islands on a 135 nm pitch. Following patterning, easy-axis coercivity increased nearly 15-fold to 12.7 kOe.

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
Engineering > Nanotechnology applications in ICT
ID Code:3770
Deposited By:SPI
Deposited On:22 Jan 2009 12:23
Last Modified:22 Jan 2009 12:23

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