Nano Archive

Wafer-scale Reduced Graphene Oxide Films for Nanomechanical Devices

Robinson, Jeremy T. and Zalalutdinov, Maxim and Baldwin, Jeffrey W. and Snow, Eric S. and Wei, Zhongqing and Sheehan, Paul and Houston, Brian H. (2008) Wafer-scale Reduced Graphene Oxide Films for Nanomechanical Devices. NANO LETTERS, 8 (10). pp. 3441-3445.

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Official URL: http://dx.doi.org/10.1021/nl8023092

Abstract

We report a process to form large-area, few-monolayer graphene oxide films and then recover the outstanding mechanical properties found in graphene to fabricate high Young's modulus (< E > = 185 GPa), low-density nanomechanical resonators. Wafer-scale films as thin as 4 nm are sufficiently robust that they can be delaminated intact and resuspended on a bed of pillars or field of holes. From these films, we demonstrate radio frequency resonators with quality factors (up to 4000) and figures of merit (f x Q > 10(11)) well exceeding those of pure graphene resonators reported to date. These films' ability to withstand high in-plane tension (up to 5 N/m) as well as their high Q-values reveals that film integrity is enhanced by platelet-platelet bonding unavailable in pure graphite.

Item Type:Article
Subjects:Engineering > Nanotechnology applications in mechanical engineering
ID Code:3013
Deposited By:Anuj Seth
Deposited On:03 Apr 2009 05:41
Last Modified:03 Apr 2009 05:41

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