Sundaramurthy, A and Schuck, P. J. and Conley, N. R. and Fromm, D. P. and Kino, G. S. and Moerner, W. E. (2006) Toward nanometer-scale optical photolithography: Utilizing the near-field of bowtie optical nanoantennas. NANO LETTERS, 6 (3). pp. 355-360. (Unpublished)
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http://www.pubmedcentral.nih.gov/articlerender.fcg...
Abstract
Optically resonant metallic bowtie nanoantennas are utilized as fabrication tools for the first time, resulting in the production of polymer resist nanostructures < 30 nm in diameter at record low incident multiphoton energy densities. The nanofabrication is accomplished via nonlinear photopolymerization, which is initiated by the enhanced, confined optical fields surrounding the nanoantenna. The position, size, and shape of the resist nanostructures directly correlate with rigorous finite-difference time-domain computations of the field distribution, providing a nanometer-scale measurement of the actual field confinement offered by single optical nanoantennas. In addition, the size of the photoresist regions yields strong upper bounds on photoacid diffusion and resist resolution in SU-8, demonstrating a technique that can be generalized to the study of many current and yet-to-be-developed photoresist systems.
| Item Type: | Article |
|---|---|
| Additional Information: | This is the final, peer reviewed manuscript |
| Subjects: | Material Science > Nanofabrication processes and tools Physical Science > Photonics |
| ID Code: | 2770 |
| Deposited By: | Lesley Tobin |
| Deposited On: | 09 Jan 2009 16:53 |
| Last Modified: | 19 Feb 2009 11:05 |
Repository Staff Only: item control page
