Nano Archive

Nanosphere monolayer-templated, ion-assisted nanofeature etching in dielectric materials: a numerical simulation of nanoscale ion flux topography

Yuan, Luqi and Zhong, Xiaoxia and Ostrikov, Kostya (Ken) (2008) Nanosphere monolayer-templated, ion-assisted nanofeature etching in dielectric materials: a numerical simulation of nanoscale ion flux topography. NANOTECHNOLOGY, 19 (15).

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Official URL: http://www.iop.org/EJ/abstract/0957-4484/19/15/155...

Abstract

The results of numerical simulations of nanometer precision distributions of microscopic ion fluxes in ion-assisted etching of nanoscale features on the surfaces of dielectric materials using a self-assembled monolayer of spherical nanoparticles as a mask are presented. It is shown that the ion fluxes to the substrate and nanosphere surfaces can be effectively controlled by the plasma parameters and the external bias applied to the substrate. By proper adjustment of these parameters, the ion flux can be focused onto the areas uncovered by the nanospheres. Under certain conditions, the ion flux distributions feature sophisticated hexagonal patterns, which may lead to very different nanofeature etching profiles. The results presented are generic and suggest viable ways to overcome some of the limitations of the existing plasma-assisted nanolithography.

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
Material Science > Nanostructured materials
ID Code:277
Deposited By:Lesley Tobin
Deposited On:21 Nov 2008 17:21
Last Modified:03 Feb 2009 11:52

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