Schmidt, V and Riel, H and Senz, S and Karg, S and Riess, W and Gösele, Ulrich (2006) Realization of a silicon nanowire vertical surround-gate field-effect transistor. SMALL, 2 (1). pp. 85-88.
Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.
Official URL: http://www3.interscience.wiley.com/journal/1121400...
Abstract
No Abstract
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | chemical vapor deposition; field-effect transistors; nanowires; silicon |
| Subjects: | Physical Science > Nanoelectronics |
| ID Code: | 2755 |
| Deposited By: | Lesley Tobin |
| Deposited On: | 19 Jan 2009 14:41 |
| Last Modified: | 03 Mar 2009 15:03 |
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