Koenderink, A. Femius and Hernandez, Jesus V. and Robicheaux, Francis and Noordam, L. D. and Polman, Albert (2007) Programmable nanolithography with plasmon nanoparticle arrays. NANO LETTERS, 7 (3). pp. 745-749.
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Official URL: http://dx.doi.org/10.1021/nl0630034
Abstract
We describe how optical contact lithography based on plasmon particle array masks allows generation of a large number of different subwavelength exposure patterns using a single mask. Within an exact point dipole model, we study the local response of silver particles in small two-dimensional arrays with 50-200 nm spacing. We show how illumination with unfocused light allows optically addressing particles either individually or in controlled configurations; which pattern will be exposed by the mask is programmed by varying the wavelength, incidence angle, and polarization of the incident wave.
| Item Type: | Article |
|---|---|
| Subjects: | Analytical Science > Microscopy and probe methods Material Science > Nanofabrication processes and tools Analytical Science > Beam methods |
| ID Code: | 2666 |
| Deposited By: | Anuj Seth |
| Deposited On: | 09 Jan 2009 10:20 |
| Last Modified: | 20 Jan 2009 11:12 |
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