Nano Archive

Programmable nanolithography with plasmon nanoparticle arrays

Koenderink, A. Femius and Hernandez, Jesus V. and Robicheaux, Francis and Noordam, L. D. and Polman, Albert (2007) Programmable nanolithography with plasmon nanoparticle arrays. NANO LETTERS, 7 (3). pp. 745-749.

Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.

Official URL: http://dx.doi.org/10.1021/nl0630034

Abstract

We describe how optical contact lithography based on plasmon particle array masks allows generation of a large number of different subwavelength exposure patterns using a single mask. Within an exact point dipole model, we study the local response of silver particles in small two-dimensional arrays with 50-200 nm spacing. We show how illumination with unfocused light allows optically addressing particles either individually or in controlled configurations; which pattern will be exposed by the mask is programmed by varying the wavelength, incidence angle, and polarization of the incident wave.

Item Type:Article
Subjects:Analytical Science > Microscopy and probe methods
Material Science > Nanofabrication processes and tools
Analytical Science > Beam methods
ID Code:2666
Deposited By:Anuj Seth
Deposited On:09 Jan 2009 10:20
Last Modified:20 Jan 2009 11:12

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