Nano Archive

Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting

Hagberg, Erik C. and Malkoch, Michael and Ling, Yibo and Hawker, Craig J. and Carter, Kenneth R. (2007) Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting. NANO LETTERS, 7 (2). pp. 233-237.

Full text is not hosted in this archive but may be available via the Official URL, or by requesting a copy from the corresponding author.

Official URL: http://pubs.acs.org/doi/abs/10.1021/nl061217f

Abstract

Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.

Item Type:Article
Subjects:Material Science > Functional and hybrid materials
Material Science > Nanochemistry
ID Code:2467
Deposited By:Farnush Anwar
Deposited On:07 Jan 2009 13:14
Last Modified:22 Jan 2009 11:38

Repository Staff Only: item control page