Hagberg, Erik C. and Malkoch, Michael and Ling, Yibo and Hawker, Craig J. and Carter, Kenneth R. (2007) Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting. NANO LETTERS, 7 (2). pp. 233-237.
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Official URL: http://pubs.acs.org/doi/abs/10.1021/nl061217f
Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.
|Subjects:||Material Science > Functional and hybrid materials|
Material Science > Nanochemistry
|Deposited By:||Farnush Anwar|
|Deposited On:||07 Jan 2009 13:14|
|Last Modified:||22 Jan 2009 11:38|
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