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Micrometer and nanometer scale photopatterning of self-assembled monolayers of phosphonic acids on aluminum oxide

Sun, Shuqing and Leggett, Graham J. (2007) Micrometer and nanometer scale photopatterning of self-assembled monolayers of phosphonic acids on aluminum oxide. NANO LETTERS, 7 (12). pp. 3753-3758.

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Official URL: http://pubs.acs.org/doi/abs/10.1021/nl072181%2B?jo...

Abstract

Self-assembled monolayers of alkylphosphonic acids (APA) have been patterned at the micrometer and nanometer scale by photochemical methods. Exposure of APA monolayers to light with a wavelength of 244 nm leads to scission of the C-P bond and desorption of the alkyl chain from the surface. Immersion of the specimen in a solution of a second APA leads to adsorption at the surface in the exposed regions. Immersion in a solution of hydroxide ions leads to etching of the exposed regions of the aluminum film. UV exposure appears to anneal the aluminum oxide film, conferring increased resistance to etching at high exposures and a switching the function of the monolayer from a positive to a negative tone resist. At intermediate exposures, nanoscale trenches form at the perimeters of exposed regions. Near-field exposure of the phosphonic acid structures, using a UV laser coupled to a scanning near-field.optical microscope, yields well-defined nanostructured features following development of the pattern in aqueous base, exemplified by the fabrication of 100 nm wide trenches.

Item Type:Article
Subjects:Material Science > Nanofabrication processes and tools
Material Science > Nanochemistry
Material Science > Nanostructured materials
ID Code:2366
Deposited By:Anuj Seth
Deposited On:17 Dec 2008 15:16
Last Modified:17 Dec 2008 15:16

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