Ma, Liang-Chieh and Subramanian, Ramkumar and Huang, Hong-Wen and Ray, Vishva and Kim, Choong-Un and Koh, Seong Jin (2007) Electrostatic funneling for precise nanoparticle placement: A route to wafer-scale integration. NANO LETTERS, 7 (2). pp. 439-445.
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Official URL: http://dx.doi.org/10.1021/nl062727c
We demonstrate a large-scale placement of nanoparticles through a scheme named ``electrostatic funneling'', in which charged nanoparticles are guided by an electrostatic potential energy gradient and placed on targeted locations with nanoscale precision. The guiding electrostatic structures are defined using current CMOS fabrication technology. The effectiveness of this scheme is demonstrated for a variety of geometries including one-dimensional and zero-dimensional patterns as well as three-dimensional step structures. Placement precision of 6 nm has been demonstrated using a one-dimensional guiding structure comprising alternatively charged lines with line width of similar to 100 nm. Detailed calculations using DLVO theory agree well with the observed long-range interactions and also estimate lateral forces as strong as (1-3) x 10(-7) dyn, which well explains the observed guided placement of Au nanoparticles.
|Subjects:||Physical Science > Nanophysics|
Physical Science > Nano objects
Material Science > Nanochemistry
|Deposited By:||Anuj Seth|
|Deposited On:||06 Jan 2009 11:17|
|Last Modified:||20 Jan 2009 11:00|
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